Optimization of optical properties of titanium nitride (TiN) thin-films

Titanium nitride (TiN) finds numerous valuable applications in microelectronics, e.g.: as a diffusion barrier, an adhesion layer, Schottky barrier contact or conductive gate material [1]. The optical properties of TiN films such as selectively spectral range of optical transmittance and refraction, make them interesting for application in various optics and photonics and potentially plasmonics, especially as the material for structures based on hyperbolic metamaterials [2,3]. The application in photonics demands the fabrication of TiN with controllable optical properties. In this study, we present the results of the optimization of thickness and optical properties of titanium nitride ultra-thin films for the application in multi-layered structures. The optimization procedure was performed by means of Taguchi orthogonal tables approach [4].